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Quality TRIS(DIMETHYLAMINO)SILANE (CAS NO. 15112-89-7) factory
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Quality TRIS(DIMETHYLAMINO)SILANE (CAS NO. 15112-89-7) factory
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TRIS(DIMETHYLAMINO)SILANE (CAS NO. 15112-89-7)

Specifications
Highlight:

Clear liquid tris(dimethylamino)silane

,

tris(dimethylamino)silane C6H19N3Si

,

15112-89-7
Product Name:
Tris(dimethylamino)silane
Appearance:
Clear Liquid
MF:
C6H19N3Si
MW:
161.32
M.P:
<0°C
B.P:
145 °C
Density:
0,838 G/cm3
Flash point:
25°C
Tags:

ethyltrimethoxysilane

methylsilane

silane
Key Attributes
Brand Name: SISO
Model Number: 15112-89-7
Place of Origin: China
Payment Terms: T/T
Product Description

1. High-activity Silylation Derivatization Reagent

This product is a high-activity trifunctional amino silane with three reactive dimethylamino groups on a single molecule. It can efficiently react with hydroxyl, carboxyl, phenolic hydroxyl and other active hydrogen groups under mild conditions to complete rapid silylation derivatization. It is widely used in chromatographic analysis sample pretreatment, organic synthesis protection and fine chemical modification.

2. Precursor for High-purity Siloxane Polymer

With three controllable hydrolytic active sites, it can be used as a key precursor for the preparation of high-crosslinking silicone resins and polysiloxane polymers. The multi-functional structure enables uniform and gradual hydrolysis and polycondensation, effectively regulating the crosslinking network density and molecular structure, and preparing high-stability and high-density silicone polymer materials.

3. High-efficiency Interface Coupling &amp; Reinforcing Modifier

The multi-active functional groups can form multi-point chemical bonding between organic polymer matrix and inorganic fillers such as silica, glass fiber and metal oxide. It significantly improves interfacial bonding strength and phase compatibility, solves interfacial peeling and defects of composite materials, and greatly enhances mechanical properties, water resistance and aging resistance of composite systems.

4. Semiconductor & Electronic Ultra-clean Passivation Material 

Featuring ultra-low metal ion impurities, high reaction activity and excellent uniform film-forming performance, it is specially applicable for surface passivation, insulation protection and hydrophobic treatment of semiconductor wafers and precision electronic components. It forms a dense inert protective film to isolate moisture, oxygen and micro-pollutants, improving device insulation stability and long-term service reliability.
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