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(2-BROMOETHOXY)-TERT-BUTYLDIMETHYLSILANE(CAS NO.86864-60-0 )
Specifications
Highlight:
Organic Synthesis Alkoxy Silane
,stable (2-bromoethoxy)-tert-butyldimethylsilane
,86864-60-0 cas
Product Name:
(2-Bromoethoxy)-tert-butyldimethylsilane
Appearance:
Clear Liquid
MF:
C8H19BrOSi
MW:
239.23
M.P:
<0°C
B.P:
70-75 °C2.5 Mm Hg(lit.)
Density:
1.115 G/mL At 25 °C(lit.)
Flash point:
163 °F
Key Attributes
Brand Name:
SISO
Model Number:
86864-60-0
Place of Origin:
China
Payment Terms:
T/T
Product Description
1. Organic Synthesis Brominated Silylation Intermediate
This product is a high-activity bifunctional silicon intermediate containing sterically hindered TBS protective group and reactive bromoalkyl segment. The terminal carbon-bromine bond possesses high chemical activity and can participate in nucleophilic substitution, coupling and chain extension reactions. It is widely applied in the structural derivation and functional modification of complex organic molecules, pharmaceutical intermediates and fine chemical compounds.
2. Efficient Hydroxyl Group Protection Reagent
The stable tert-butyldimethylsilyl steric hindrance structure provides reliable shielding protection for active hydroxyl groups in organic synthesis. It features mild reaction conditions, high protection selectivity and stable chemical properties. The protected groups can be efficiently removed under specific acidic or fluorine-containing conditions, which is suitable for multi-step synthesis and structural optimization of high-purity fine chemicals.
3. Functional Modifier for Polymer Material Synthesis
The bifunctional structure integrating bromoalkyl active site and low-surface-energy siloxane segment can be used for the graft modification and copolymerization of polymer materials. It can effectively adjust the molecular chain arrangement, reduce surface polarity, and significantly improve the hydrophobicity, chemical stability and structural toughness of modified polymer materials.
4. Precision Electronic Material Surface Regulator
With low impurity content, stable steric hindrance structure and excellent surface film-forming performance, it can be used for surface functional modification of electronic fillers and precision electronic components. It can form a uniform inert protective layer on the material surface, optimize interface compatibility, and improve the moisture resistance, insulation stability and environmental adaptability of electronic materials.
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